Exhibitors
Beamfox
Beamfox Technologies is a leading provider of state-of-the-art software solutions for electron-beam lithography systems. Our main product, Beamfox Proximity, provides high-performance proximity effect correction, exposure corrections, and data preparation for electron-beam lithography systems in an intuitive, user-friendly software package. The software allows quickly correcting common exposure problems – such as proximity effects, field stitching errors, and fracturing errors – while accelerating and streamlining the entire data preparation process.
DOD Technologies
Electron Mec
Gambetti
Since 1974, Gambetti Kenologia has been successfully selling, distributing, and servicing vacuum technology instrumentation and related techniques, such as process, surface characterization and process control systems, across Italy. For the past 20 years, manufacturer of vacuum plasma systems for surface treatment, specializing in nanometer cleaning to address issues related to contamination, bonding, wettability, and painting.
Heidelberg Instruments
Founded in 1984, with over 1,500 systems installed across more than 50 countries, Heidelberg Instruments is a global leader in the design, development, and production of high-precision laser lithography systems, maskless aligners, and nanofabrication systems. The solutions range from tabletop tools to high-end photomask manufacturing equipment. These versatile systems enable micro- and nanoscale surface structuring, including 2D-patterning and 2.5D Grayscale lithography. Renowned universities, R&D institutes, and industrial facilities worldwide trust these systems for applications in micro-optics, photonics, electronics, semiconductors, quantum devices, MEMS, microfluidics, 2D materials, and beyond.”
JEOL
JEOL is a leading global supplier of scientific instruments used for research and development in the fields of nanotechnology and nanofabrication. Utilizing its unique technologies, products, services, and knowledge, JEOL helps its customers make significant breakthroughs in product development and scientific research from 1949.
JEOL products range from scientific instrumentation to industrial equipment including Scanning electron microscopes (SEM), Dual Beam (FIB), Transmission electron microscopes (TEM), Auger micro probe analyzers (AES), Electron probe micro analyzers (EPMA), Photoelectron spectrometers (XPS), Mass spectrometers, NMR spectrometers and semiconductor tools like Electron beam lithography (EBL).
With his long experience and highly organized structure, JEOL is able to provide highly valuable service assistance as well as application support in order to match even the most demanding customer requests.
Kloe
KLOE is a leader in photolithography systems, providing cutting-edge instrumentation for nearly 25 years. It is the only manufacturer offering a full range of photolithography equipment worldwide, covering mask-based lithography, direct laser writing, and even 3D printing via stereolithography. Below is an overview of these systems:
• UV-KUB Series: This range includes mask-based lithography systems, featuring the UV-KUB-2 masking system and the UV-KUB-3 mask aligner, which was recently awarded “Mask Aligner Manufacturer of the Year 2025” by US Outlook Manufacturing Magazine. These tabletop and intuitive systems utilize an advanced LED matrix, offering significant advantages over traditional mercury lamps. KLOE has developed an advanced optical addressing system for these LEDs, achieving an unmatched collimation with a divergence angle below 1.5°. This ensures sub-micron resolution and the ability to expose thick layers (several hundred micrometers) with vertical sidewalls.
• Dilase Series: This range includes maskless laser writers, available in tabletop and standalone versions for greater modularity. Here too, KLOE has developed advanced optical addressing to provide an unrivaled depth of field. This allows to single-pass laser writing in thick layers while maintaining perfectly vertical sidewalls and achieving high aspect ratios up to 1:50 (width:thickness). Dilase Series use a specific vectorial writing, eliminating pattern roughness and enabling the direct fabrication of complex structures. This vectorial writing mode can also be combined with a scanning mode to optimize writing speed.
• Dilase 3D: Designed for high-resolution 3D microfabrication (<5 µm) while offering a large build volume, this system fills a gap in the market. KLOE’s advanced optical processing ensures smooth and low-roughness sidewalls, making it ideal for demanding applications in microfluidics and photonics.
KLOE has installed over 600 systems worldwide serving industries and research institutes working in microelectronics, photonics, micro-optics, mechanics, microfluidics, and surface structuring, among others.
NanoScribe
We provide the most advanced, high-precision 3D printers and grayscale lithography systems with application-specific solutions. As the leading innovator and market leader in additive manufacturing, we provide application-specific solutions at the nano-, micro-, meso- and macro-scale. Our patented technology empowers cutting-edge science and drives industrial innovations in various sectors, including microoptics, micromechanics, biomedical engineering, and photonics technologies.
RAITH
RAITH is a leading provider and manufacturer of systems for nanofabrication, electron beam lithography, FIB-SEM nanofabrication, laser beam lithography, and imaging and analysis. Founded in 1980 and headquartered in Dortmund, Germany, the company offers solutions for researchers and engineers in both academic and industry settings. With about 390 employees supporting customers in Europe, the Americas, Asia, and the Pacific region, RAITH provides a professional support infrastructure that delivers added value to its customers. RAITH counts high-level universities, academic institutions as well as companies in the high technology business among its clientele. For more information, please visit www.raith.com.
Sentech
DEAM and SENTECH in partnership form a strong team in semiconductor technology, microsystems, nanotechnology and materials research industry expertise. Delivering high-performance plasma process and thin film metrology systems to provide leading-edge application solutions for R&D and industry customers. Founded in 2015 in Biella, Italy, DEAM is a leading consulting firm in the microelectronics industry, specialising in sales, marketing, and logistics support for top-tier companies. With over 30 years of expertise, Berlin-based SENTECH Instruments develops, manufactures, and markets cutting-edge capital equipment globally. Our advanced systems enable precision deposition and etching of materials used in MEMS, optoelectronics and power devices. Our metrology tools offer precise measurement and characterisation for semi and fully-automated thin film quality control.
STS-Elionix
STS-Elionix is a collaborative partnership between SEMTech Solutions and Elionix, focused on delivering Electron Beam Lithography systems across North America and Europe. For 50 years (since 1975), Elionix has been at the forefront of fabrication, measurement, and analysis technologies, with over 450 Electron Beam Lithography (EBL) systems installed globally.
The company’s product line includes the ELS-BODEN Series, designed for research applications, offering ultra-high resolution and throughput with acceleration voltages from 50kV to 150kV. For production needs, the ELS-BODEN Σ Series features a 400MHz high-speed scan clock and rapid stage movement with comprehensive robotic loaders. Additionally, the ELS-HAYATE model enables full 8-inch wafer fabrications of nanoimprint molds within hours, catering to both high-mix and low-volume production scenarios. The ELS-ORCA offers cutting-edge performance on a customized platform for R&D applications with various options including high resolution SEM imaging.
Headquartered in Massachusetts, STS-Elionix serves a diverse clientele, including national laboratories, research universities, and industrial entities. The company’s expertise in EBL systems supports applications such as 3D photonic structures, photonic crystal fibers, surface acoustic wave patterns, nano-gaps, high aspect ratio features, and more.
Through its commitment to innovation and precision, STS-Elionix plays a pivotal role in advancing nanofabrication technologies, enabling researchers and industry professionals to achieve new milestones in nanotechnology.
